Tag: Nanoimprint lithography
Carpe Diem Technologies Issued Patent US9804488 for the production of products incorporating NIL features
eNewsChannels NEWS: -- Carpe Diem Technologies has been issued Patent US9804488 for the production of products incorporating NIL features. The system is entitled 'System and method for fabricating miniature structures on a flexible substrate.'The patent's key claims facilitate roll-to-roll or flexible panel manufacturing of very precise complex devices - inexpensively.
