Tags Nanoimprint lithography

Tag: Nanoimprint lithography

Carpe Diem Technologies Issued Patent US9804488 for the production of products incorporating NIL features

eNewsChannels NEWS: -- Carpe Diem Technologies has been issued Patent US9804488 for the production of products incorporating NIL features. The system is entitled 'System and method for fabricating miniature structures on a flexible substrate.'The patent's key claims facilitate roll-to-roll or flexible panel manufacturing of very precise complex devices - inexpensively.

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